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LYRA FIB-SEM

Tescan LYRA-3

Tescan LYRA-3 Model GMH Focused Ion Beam Microscope

  • Schottky Field Emission Electron Source
  • SE, BSE detectors
  • STEM (dark and bright field imaging)
  • EBIC imagining system (electron beam induced conductivity)
  • Fully integrated Canion Ga LMIS Focused Ion Beam column
  • 5-Reservoir Gas Injection System: W deposition, Pt deposition, Insulator (SiOx) deposition, Enhanced Etching (H2O), Enhanced or selective etching of Si, SiO2, Si3N4, W (XeF2)
  • SmarAct 3-axis (XYZ) Piezo Nanomanipulator and controller
  • Beam Deceleration Mode for imaging at low voltage
  • Standard EDS Microanalysis System with X- MaxN 50

Typical Applications:

  • FIB milling (etching) or FIB deposition of well-defined micro and nano structures
  • Milling surface cross section to investigate the structure or composition
  • Preparation of TEM lamellae and in-situ lift out

The procedure for booking a training session for the LYRA-FIB:

    1. Book a Pre-Training Meeting with both Dr. Sisi Xiang and Dr. Winson Kuo.
    2. Set up an iLab account with the MCF by user and PI.
    3. You will be contacted once your iLab account has been set up.
    4. Set up the time for actual training between 9:30 am to 12:30 pm; 2:00 pm to 5:00 pm, M-F with the Dr. Xiang.

For training on the TOF-SIMS contact Dr. Yordanos Bisrat.