Tescan FERA-3 Model GMH Focused Ion Beam Microscope

• Schottky Field Emission Electron Source
• SE, BSE detectors
• Integrated Plasma Ion Source (Xe) Focused Ion Beam (FIB)
• DrawBeam Basic Electron and Ion Beam Lithography Software
• Motorized Retractable Panchromatic Cathodoluminescence Detector (350 nm – 650 nm spectral range)
• MonoGIS Gas Injection System (Platinum)
• Standard EBSD with a NordlysNano high sensitivity camera and 3D EBSD capabilities
• Integrated Time-of-Flight Mass Spectrometer (TOF-SIMS)

Typical Applications:

• Fast FIB milling (etching) or FIB deposition of well-defined micro and nano structures
• Milling surface cross section to investigate the structure
• TOF-SIMS
• EBSD

To be trained on the FERA, please contact Dr. Winson Kuo.  For TOF-SIMS, please contact Dr. Bisrat.