Tescan FERA-3 Model GMH Focused Ion Beam Microscope
- Schottky Field Emission Electron Source
- SE, BSE detectors
- Integrated Plasma Ion Source (Xe) Focused Ion Beam (FIB)
- DrawBeam Basic Electron and Ion Beam Lithography Software
- Motorized Retractable Panchromatic Cathodoluminescence Detector (350 nm – 650 nm spectral range)
- MonoGIS Gas Injection System (Platinum)
- Standard EBSD with a NordlysNano high sensitivity camera and 3D EBSD capabilities
- Integrated Time-of-Flight Mass Spectrometer (TOF-SIMS)
Typical Applications:
- Fast FIB milling (etching) or FIB deposition of well-defined micro and nano structures
- Milling surface cross section to investigate the structure
- TOF-SIMS
- EBSD
For training on this instrument, please contact Dr. Andrew Mott.
For training on the FIB contact Dr. Sisi Xiang.
For training on the TOF-SIMS, please contract Dr. Yordanos Bisrat.
