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FERA FIB-SEM

Tescan FERA-3

Tescan FERA-3 Model GMH Focused Ion Beam Microscope

  • Schottky Field Emission Electron Source
  • SE, BSE detectors
  • Integrated Plasma Ion Source (Xe) Focused Ion Beam (FIB)
  • DrawBeam Basic Electron and Ion Beam Lithography Software
  • Motorized Retractable Panchromatic Cathodoluminescence Detector (350 nm – 650 nm spectral range)
  • MonoGIS Gas Injection System (Platinum)
  • Standard EBSD with a NordlysNano high sensitivity camera and 3D EBSD capabilities
  • Integrated Time-of-Flight Mass Spectrometer (TOF-SIMS)

Typical Applications:

Ion image of Texas A&M logo etched into silicon

Ion image of Texas A&M logo etched into silicon

  • Fast FIB milling (etching) or FIB deposition of well-defined micro and nano structures
  • Milling surface cross section to investigate the structure
  • TOF-SIMS
  • EBSD

FIB Training Policy

To be trained on the FERA, please contact Dr. Winson Kuo.  For TOF-SIMS, please contact Dr. Bisrat.